Production and destruction of CFx radicals in radio‐frequency fluorocarbon plasmas
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چکیده
منابع مشابه
molecular and physiological characterizations of floral scent production in rosa damascena mill.
گل محمدی (r. damascena mill.)مهمترین گونه ای است که در تولید گلاب، عطر و اسانس، در صنعت عطرسازی و دارویی کاربرد دارد. با وجود اهمیت عطر گل محمدی، پژوهش های مولکولی و بیوشیمیایی عطر گل این گونه هنوز در مراحل ابتدایی است. در این پژوهش، ویژگی های مولکولی و فیزیولوژیکی تولید عطر در گل محمدی در آزمایش های مختلف مورد بررسی قرار گرفتند. در آزمایش اول، پژوهشی به منظور بررسی تنوع شیمیایی اسانس میان 44 ت...
Etching of xerogel in high-density fluorocarbon plasmas
s of the 44th National Symposium of the American Vacuum Society, San Jose, CA, 20–24 Oct. 1997, p. 215. S.-J. Wang, I.-S. Jin, and H.-H. Park, Surf. Coat. Technol. 100–101, 59 ~1998!. M. Schaepkens, N. R. Rueger, J. J. Beulens, X. Li, T. E. F. M. Standaert, P. J. Matsuo, and G. S. Oehrlein, J. Vac. Sci. Technol. A 17, 3272 ~1999!. H.-H. Park, M.-H. Jo, H.-R. Kim, and S.-H. Hyon, J. Mater. Sci. ...
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Quantitative results from infrared laser absorption spectroscopy ~IRLAS! of CF and CF2 radicals and COF2 products in inductively coupled plasmas fed with C2F6, CHF3 and C4F8 are presented and compared with results simultaneously obtained by mass spectrometry and optical emission spectroscopy. These plasma gas-phase analysis results are discussed and compared to fluorocarbon deposition and etchi...
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متن کاملElectron attachment to C2 fluorocarbon radicals at high temperature.
Thermal electron attachment to the radical species C2F3 and C2F5 has been studied over the temperature range 300-890 K using the Variable Electron and Neutral Density Attachment Mass Spectrometry technique. Both radicals exclusively undergo dissociative attachment to yield F(-). The rate constant for C2F5 shows little dependence over the temperature range, remaining ~4 × 10(-9) cm(3) s(-1). The...
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ژورنال
عنوان ژورنال: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
سال: 1996
ISSN: 0734-2101,1520-8559
DOI: 10.1116/1.580094